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Reducing SU-8 hygroscopic swelling by ultrasonic treatment.pdf

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Reducing SU-8 hygroscopic swelling by ultrasonic treatment.pdf
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Progress in EUV resist development - 2007.pdf
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Rise of chemical amplification resists from laboratory curiosity to paradigm enabling Moore's law.pdf
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Polymers for microelectronics - 1993.pdf
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SU-8: a photoresist for high-aspect-ratio and 3D submicron lithography.pdf
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Photoinitiated polymerization: advances, challenges, and opportunities - 2010.pdf
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SU-8 photolithography and its impact on microfluidics.pdf
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Novel resist materials for next generation lithography.pdf
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Straight SU-8 pins.pdf
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Nanolithography made from water-based spin-coatable LSMO resist.pdf
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Use of photoresists in the electronics industry (slides).pdf
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Molecular resists for advanced lithography-design, synthesis, characterization, and simulation.pdf
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Water-assisted formation of micrometer-size honeycomb patterns of polymers.pdf
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Molded biocompatible and disposable PDMS SU-8 inket dispenser.pdf
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Light-induced nanostructure formation using azobenzene polymers.pdf
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Influence of photo-initiator concentration on residual mechanical stress in SU-8 thin films.pdf
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Direct laser writing of surface reliefs in dry, self-developing photopolymer films.pdf
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Development of inorganic resists for electron beam lithography: novel materials and simulations.pdf
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Design and syntheses of photoactive polymer systems capable of chemical amplification.pdf
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Comparative assessment of different sacrificial materials for releasing SU-8 structures.pdf
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